Low Consumption Front End Of the Line Cleaning : LC-FEOL

Low Consumption Front End Of the Line Cleaning : LC-FEOL

This article presents the Low Consumption Front End Of the Line cleaning: LC-FEOL, which addresses technical constraints imposed by SOI and advanced CMOS technologies. These technologies require low silicon and oxide consumption with the same or higher performance levels in terms of particle and metal removal efficiency as standard cleanings. The LC-FEOL cleaning uses ultra dilute SC1 and HF chemistries combined with megasonic energy as basic cleaning mechanism and respects the general environmental tendencies by drastically reducing the amount of chemical products that are used.