Technical Articles

Effect of Dissolved Ozone and In-Situ Wafer Cleaning on Pre-Epitaxial Deposition for Next Generation Semiconductor Devices

Effect of Dissolved Ozone and In-Situ Wafer Cleaning on Pre-Epitaxial Deposition for Next Generation Semiconductor Devices

The effect of in-situ process cleaning before epitaxial deposition was studied. The process includes using dissolved ozone to remove organics ...
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Application of In-situ Pre-epi Clean Process for Next Generation Semiconductor Devices

Application of In-situ Pre-epi Clean Process for Next Generation Semiconductor Devices

As electronic devices are evolving to more diversified and specifically function-oriented applications, silicon-based semiconductors have shown their limitation to unprecedented ...
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Cost of ownership comparison of single wafer processes for stripping copper pillar bump photomasks

Cost of ownership comparison of single wafer processes for stripping copper pillar bump photomasks

A new generation of negative tone and chemically amplified positive tone photoresists by TOK, JSR, Dow Chemical and others has ...
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